Semiconductor process engineers would love to develop successful process recipes without the guesswork of repeated wafer testing. Unfortunately, developing a successful process can’t be done without ...
It is becoming more and more difficult in nanometer designs to reliably print the image intended by the designer. This task is demanding enough under normal conditions; maintaining pattern fidelity ...
A new methodology to assess the impact of fabrication inherent process variability on 14-nm fin field effect transistor (FinFET) device performance. August 18th, 2021 - By: Coventor A new methodology ...
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